dopant

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dop·ant

 (dō′pənt)
n.
A substance, such as boron, added in small amounts to a pure semiconductor material to alter its conductive properties for use in transistors and diodes.

American Heritage® Dictionary of the English Language, Fifth Edition. Copyright © 2016 by Houghton Mifflin Harcourt Publishing Company. Published by Houghton Mifflin Harcourt Publishing Company. All rights reserved.

dopant

(ˈdəʊpənt)
n
(Chemical Engineering) an element or compound used to dope a semiconductor
[C20: see dope, -ant]
Collins English Dictionary – Complete and Unabridged, 12th Edition 2014 © HarperCollins Publishers 1991, 1994, 1998, 2000, 2003, 2006, 2007, 2009, 2011, 2014

dop•ant

(ˈdoʊ pənt)

n.
an impurity added to a semiconductor to enable it to conduct electricity in either of two different modes.
(dope + -ant]
Random House Kernerman Webster's College Dictionary, © 2010 K Dictionaries Ltd. Copyright 2005, 1997, 1991 by Random House, Inc. All rights reserved.
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References in periodicals archive
SEM investigations of the samples revealed that increasing dopant concentration of V increased the grain size little .
The decrease in crystallite size occurs through defects generated by the substitution of the network modifier ([Zn.sup.2+]) by the dopant ([Eu.sup.3+] or [Pr.sup.3+]), generating distortions in the crystalline lattice [19], which consequently contributes to technological applications.
In addition, the nanocomposites were doped with a binary dopant system to retain their electrical conductivity for longer period.
Recently, we reported a YAG transparent ceramics using divalent dopants (CaO and MgO) as sintering aids and found that CaO dopant was more effective in the suppression of grain growth than MgO.
It uses a controlled atmosphere, and adds small quantities of dopant gas for grafting, and dopant monomers for nano coating.
Uneven NiSi/Si interface [14] and random dopant fluctuation (RDF) [15, 16] can also fluctuate the contact resistivity and thus induce the DC performance variations.
[40] showed that there is a synergistic effect of N dopant and oxygen vacancy in Ti[O.sub.2] contributing to the significant enhancement of the visible light photoactivity.
By carefully choosing the type and amount of dopant, researchers can alter semiconductors' electronic structure and electrical behavior in a variety of ways.
The electrical resistivity has been found to decrease with the increase in the dopant concentration.
This process increases thermal budget, which may result in a reduced surface dopant concentration, increased diffusion depth of preformed doping region, and reduced excess carrier lifetime due to thermal degradation.
Scanning capacitance microscopy (SCM) is one of the most commonly used techniques for dopant profiling in the semiconductor industry [1-4].
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