patent, number 5,444,538, for a method that can improve overlay registration in mix-and-match wafer stepper environments by as much as 30 percent.
Semiconductor manufacturers have embraced the idea of mix-and-match -- mixing top-of-the-line narrow-field steppers for critical layers and wide-field steppers for non-critical layers -- to improve overall productivity and reduce costs.
Use of ARGUS Non-Concentric Matching software will reduce the error budget, allowing manufacturers to use mix-and-match techniques to build next-generation ICs with smaller geometries and tighter tolerances.
But in a mix-and-match environment, exposure fields are non-concentric.
In a typical mix-and-match environment, ARGUS Non-Concentric Matching software will improve overlay accuracy by an extra 40 to 50 nanometers.
the world's leading supplier of mix-and-match systems for the semiconductor industry.
Ultratech, which offers mix-and-match solutions for 0.