today announced an agreement to collaborate on integrated hardware and software solutions for advanced IC mask
Jasdaq:6256) today announced the extension of their successful collaboration on integrated hardware and software solutions for advanced IC mask
Present on the GSA & IET analogue panel were Ross Addinall, Europe technical director at Ciranova, Peter Frith, chief technical officer of Wolfson Microelectronics, Doug Pattullo, director of Field Technical Support at TSMC Europe and Ciaran Whyte, co-founder and chief technical officer at IC Mask
The new HiPer DevGen tool, developed in collaboration with IC Mask
Design, is offered as an add-on option that focuses on silicon quality and yield to generate production-ready devices.
Tanner EDA Layout Expertise and IC Mask
Design's Layout Technology to Boost Design Productivity and Quality
Traditionally, custom clocks have not been available for the broad market due to the need to generate custom IC mask
AISS provides software (including SiCat-Core, OPTISSIMO, and PROXECCO) to model and compensate for the physical effects involved in IC mask
making and lithography.