photomask

(redirected from IC mask)
Also found in: Encyclopedia.

photomask

(ˈfəʊtəʊˌmɑːsk)
n
(Printing, Lithography & Bookbinding) an opaque image on a transparent plate that is used to filter light so the image can be transferred, used to etch patterns for integrated circuits
References in periodicals archive ?
today announced an agreement to collaborate on integrated hardware and software solutions for advanced IC mask writing.
Jasdaq:6256) today announced the extension of their successful collaboration on integrated hardware and software solutions for advanced IC mask generation.
Present on the GSA & IET analogue panel were Ross Addinall, Europe technical director at Ciranova, Peter Frith, chief technical officer of Wolfson Microelectronics, Doug Pattullo, director of Field Technical Support at TSMC Europe and Ciaran Whyte, co-founder and chief technical officer at IC Mask Design.
The new HiPer DevGen tool, developed in collaboration with IC Mask Design, is offered as an add-on option that focuses on silicon quality and yield to generate production-ready devices.
Tanner EDA Layout Expertise and IC Mask Design's Layout Technology to Boost Design Productivity and Quality
Traditionally, custom clocks have not been available for the broad market due to the need to generate custom IC mask sets.
AISS provides software (including SiCat-Core, OPTISSIMO, and PROXECCO) to model and compensate for the physical effects involved in IC mask making and lithography.