ion implantation


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ion implantation

n
(Electronics) a technique used in the manufacture of semiconductor devices in which impurities are implanted by means of beams of electrically accelerated ions
References in periodicals archive ?
Figure 2(a) shows that the PL from a sample with Si-NCs (synthesized by method A), ater Ag ion implantation at 1 MeV, is then annealed at 600[degrees]C in RA for 1 h.
Chu et al.[52] described the recent applications of plasma immersion ion implantation (PIII) to the surface modification of NiTi orthopedic materials.
Key words: cutting tools, cardboard products, press production, PVD process, ion implantation
The patent covers Varian Semiconductor's control system, known as VCS, for VIISta ion implantation systems.
The new Quantum ion implantation system uses a new, small footprint platform that bridges 200mm and 300mm wafer sizes.
Urbassek, "Simulation of sheath dynamics and current nonuniformity in plasma-immersion ion implantation of a patterned surface," Journal of Applied Physics, vol.
The properties and structure of W-C:H films prepared by the process combining reactive magnetron sputtering with plasma source ion implantation were reported by Baba and coworkers [20].
The combination will add ion implantation technology to Applied Materialsa[euro](tm) portfolio, strengthening its position in wafer fabrication equipment, the buyer said.
Surface modification techniques include the following: ion implantation or deposition of ceramic layers (TiN, DLC, [Al.sub.2][O.sub.3], Zr[O.sub.2]), by plasma spraying, chemical vapour deposition (CVD), physical vapour deposition (PVD) etc (de Groot et al, 1998).
Coverage also encompasses decreasing defect densities; controlling surface morphology, residual impurities, and extended defects; device processing technologies, including ion implantation, oxidation, etching and contacts; and developing, fabricating, and testing device structures and concepts.
Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation, rapid thermal processing, and cleaning and curing systems.
With the advent of practical high-dose/low-energy ion implantation equipment, instruments are available to do any jobs we need them to do.